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Easy Writing of Nanopatterns on a Polymer Film Using Electrostatic Nanolithography
Author(s) -
Jegadesan Subbiah,
Sindhu Swaminathan,
Valiyaveettil Suresh
Publication year - 2006
Publication title -
small
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.785
H-Index - 236
eISSN - 1613-6829
pISSN - 1613-6810
DOI - 10.1002/smll.200500370
Subject(s) - nanolithography , materials science , nanotechnology , polymer , dip pen nanolithography , atomic force microscopy , substrate (aquarium) , methacrylic acid , lithography , nanostructure , optoelectronics , polymerization , fabrication , composite material , medicine , oceanography , alternative medicine , pathology , geology
Writing high and low! Atomic force microscopy (AFM) is used to fabricate nanolines and nanopits (see Figure) on a poly(methacrylic acid) (PMAA) film deposited on a Si(100) substrate. The kinetics and growth of the nanopattern from the polymer film are investigated by electrostatic nanolithography by using different applied voltages, duration of patterning, and speed of the AFM tip.