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Sub‐100 nm, Centimeter‐Scale, Parallel Dip‐Pen Nanolithography
Author(s) -
Salaita Khalid,
Lee Seung Woo,
Wang Xuefang,
Huang Ling,
Dellinger Timothy M.,
Liu Chang,
Mirkin Chad A.
Publication year - 2005
Publication title -
small
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.785
H-Index - 236
eISSN - 1613-6829
pISSN - 1613-6810
DOI - 10.1002/smll.200500202
Subject(s) - nanolithography , dip pen nanolithography , cantilever , substrate (aquarium) , atomic force microscopy , nanotechnology , resolution (logic) , materials science , microscope , scale (ratio) , computer science , optoelectronics , optics , fabrication , physics , composite material , geology , medicine , alternative medicine , pathology , quantum mechanics , oceanography , artificial intelligence
Atomic force microscope (AFM) cantilever linear arrays are used for parallel dip‐pen nanolithography (DPN). Three different tip configurations are studied, all of which involve only a single feedback system in a conventional AFM instrument or an Nscriptor, a dedicated instrument designed for DPN. A simple and convenient tip–substrate alignment procedure provides centimeter‐scale, sub‐100 nm resolution patterning (see micrograph image).