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Preparation of Ta 3 N 5 Nanosheet by Nitridation of Monolayer Tantalum Oxide Nanosheet
Author(s) -
Hsu ChuWei,
Awaya Keisuke,
Tsushida Masayuki,
Sato Tetsuya,
Koinuma Michio,
Ida Shintaro
Publication year - 2020
Publication title -
chemistryselect
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.437
H-Index - 34
ISSN - 2365-6549
DOI - 10.1002/slct.202004129
Subject(s) - nanosheet , tantalum , materials science , tantalum nitride , oxide , nitride , monolayer , annealing (glass) , photocatalysis , chemical engineering , nanotechnology , inorganic chemistry , catalysis , metallurgy , layer (electronics) , chemistry , organic chemistry , engineering
Two‐dimensional semiconducting materials have attracted attention as photocatalysts, electrode catalysts and electronic materials. However, preparation of metal nitride nanosheet is still a significant challenge. Here, we show a tantalum nitride (Ta 3 N 5 ) nanosheet with a thickness of 1.5 nm prepared via tantalum oxide [TaO 3 ] − nanosheet derived from layered rubisium tantalum oxide (RbTaO 3 ). The monolayer tantalum oxide nanosheet was converted to Ta 3 N 5 nanosheet with a [110] preferred orientation in the in‐plane direction during annealing under NH 3 gas flow, and showed a photocatalytic activity for H 2 evolution under visible light illumination (550 nm). The H 2 evolution ratio of the ultrathin Ta 3 N 5 nanosheet was much higher than that of bulk Ta 3 N 5 prepared from Ta 2 O 5 powder, indicating that nanosheet structure suppresses the recombination in the photocatalytic reaction.