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Facile Spray Deposition of Photocatalytic ZnO/Cu–In‐Zn‐S Heterostructured Composite Thin Film
Author(s) -
Yang KaiYu,
Hsu HanWen,
Hsieh HsinYi,
Chang WeiChieh,
Li MengChi,
Lin PoChang,
Lee ChengChung,
Liu ChengLiang,
Lee TaiChou
Publication year - 2016
Publication title -
chemistryselect
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.437
H-Index - 34
ISSN - 2365-6549
DOI - 10.1002/slct.201600855
Subject(s) - materials science , photocurrent , composite number , dielectric spectroscopy , thin film , chemical engineering , water splitting , photocatalysis , semiconductor , photoelectrochemistry , photoelectrochemical cell , hydrogen production , electrochemistry , electrode , electrolyte , nanotechnology , composite material , hydrogen , optoelectronics , chemistry , catalysis , biochemistry , engineering , organic chemistry
We present a sprayed composite thin film, comprising Cu−In‐Zn−S (CIZS) particles embedded in ZnO matrix for photoelectrochemical hydrogen production from water splitting. CIZS, a photoactive semiconductor was used as a photon absorber, whereas ZnO channels as the pathway for charge transfer. It was found that the distribution of the CIZS particles had a direct impact on the photoelectrochemical (PEC) activity. A more homogeneous dispersion of smaller CIZS particles (0.56 μm) within ZnO matrix exhibited a higher photocurrent density, and 3.27 μmol/ cm 2 hydrogen evolution for 5 h. Electrochemical impedance spectroscopy (EIS) was employed to analyze the charge transfer mechanism of this composite thin film. In addition, ZnO coating on top of CIZS particles also served as the adhesion and protection layers. All the PEC experiments were performed in 0.5 M K 2 SO 4 electrolyte. No sacrificial reagents were used. The composite electrode was stable under illumination: 75.67 % of photo‐activity remained after 1 h illumination at a bias of 0.2 V vs. SCE. This study demonstrates a simple and low‐cost spray preparation of composite thin film consisting of particles embedded in any semiconductor matrix.