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XPS and ISS studies on the interaction of H 2 S with polycrystalline Cu, Cu 2 O and CuO surfaces
Author(s) -
Galtayries A.,
Bonnelle J.P.
Publication year - 1995
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740230308
Subject(s) - copper , x ray photoelectron spectroscopy , adsorption , crystallite , chemistry , metal , oxide , inorganic chemistry , analytical chemistry (journal) , monolayer , chemisorption , single crystal , crystallography , chemical engineering , biochemistry , organic chemistry , engineering , chromatography
The first steps of H 2 S adsorption have been studied on polycrystalline copper samples, which are more relevant to industrial copper samples than to single‐crystal surfaces. The tools for characterization are ultrahigh vacuum spectroscopic methods, such as x‐ray photoelectron and ion scattering spectroscopies. The H 2 S adsorption on metallic copper and on the corresponding Cu 2 O and CuO oxides is dissociative and highly dependent on the chemical nature of the exposed surface rather than on the temperature, from room temperature up to 623 K. In our conditions, Cu o sulphidation deals with the top Cu o layer whereas two to three oxide surface monolayers are modified at H 2 S saturation. The results on oxides are interpreted by an oxygen/sulphur replacement mechanism following the dissociative adsorption. Contaminated copper surfaces by phenanthrene or H 2 O treatments are hardly sulphided. As far as surface reactivity is concerned, the adsorbed sulphide species have been shown to be quite strongly bound to the different surface states tested in this work: only oxidative treatments induce desorbing products at 623 K.