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Characterization of plasma‐deposited styrene films by XPS and static SIMS
Author(s) -
Leggett Graham J.,
Ratner Buddy D.,
Vickerman John C.
Publication year - 1995
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740230104
Subject(s) - x ray photoelectron spectroscopy , degree of unsaturation , static secondary ion mass spectrometry , secondary ion mass spectrometry , analytical chemistry (journal) , styrene , characterization (materials science) , chemistry , mass spectrometry , oxygen , polymer , materials science , chemical engineering , polymer chemistry , nanotechnology , organic chemistry , chromatography , engineering , copolymer
Plasma‐polymerized styrene films were studied by static secondary ion mass spectrometry (SIMS) and x‐ray photoelectron spectroscopy (XPS). The two techniques were found to yield complementary data regarding film chemical structure. Static SIMS proved to be highly sensitive to subtle changes in surface chemistry. For example, the static SIMS spectra exhibited features due to polymer cross‐linking and unsaturation. X‐ray photoelectron spectroscopy provided a good indication of the extent of oxygen incorporation into the plasma‐deposited films and characterization of time‐dependent changes in film composition.