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AES and SAM studies of oxide formation on Inconel 600 at high temperatures
Author(s) -
Alstrup N. C.,
Langvad N.,
Chorkendorff I.
Publication year - 1994
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740220194
Subject(s) - inconel , oxide , alloy , materials science , partial pressure , metallurgy , layer (electronics) , analytical chemistry (journal) , atmospheric pressure , oxygen , chemistry , nanotechnology , chromatography , geology , organic chemistry , oceanography
Characterization of the oxide formed on a Ni‐based alloy (Inconel 600) at high temperatures has been carried out using AES and SAM combined with ion‐etched depth profiling. The oxidation experiment was done at 1000 °C, in atmospheric air and under mild (H 2 /H 2 O) oxidation conditions. In air, the resulting surface is highly inhomogeneous, featuring large Ni‐rich islands on top of a continuous Cr‐rich oxide layer. When the oxygen partial pressure (H 2 /H 2 O) was lowered, the Ni‐rich layer was not formed.