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XPS and AES study of Al 2 O 3 /Ti6Al4V interface: Influence of oxidation and nitruration of the metal surface
Author(s) -
Delogu P.,
DikonimosMakris T.,
Giorgi R.,
Lascovich J.,
Caneve L.,
Scaglione S.
Publication year - 1994
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740220152
Subject(s) - auger electron spectroscopy , x ray photoelectron spectroscopy , sputtering , materials science , chemical state , coating , microstructure , substrate (aquarium) , titanium , metal , analytical chemistry (journal) , chemical composition , chemical engineering , metallurgy , thin film , chemistry , composite material , nanotechnology , oceanography , physics , chromatography , geology , nuclear physics , engineering , organic chemistry
Important properties of the coating/substrate combination like hardness, stress and, in particular, adhesion rely partly on the morphology and microstructure of the interface, which is often physically and chemically different from the substrate as well as from the coating. The aim of this work is to study the influence of the chemical state of the metal surface on the structure of the interface Al 2 O 3 /Ti6Al4V, obtained by deposition via sputtering of the ceramic. For this purpose three different surface treatments of the substrate were performed: air oxidation, cleaning by Ar + sputtering and nitrogen ion implantation. The chemical composition of the treated surfaces was assessed by x‐ray photoelectron spectroscopy, while the composition of the interfaces was investigated by Auger electron spectroscopy depth profiling.