In situ  quantitative soft x‐ray spectrometry of thin films synthesized by DC sputtering | Zendy

Legrand P. B. | Zendy; Dauchot J. P. | Zendy; Wautelet M. | Zendy; Hecq M. | Zendy

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In situ quantitative soft x‐ray spectrometry of thin films synthesized by DC sputtering

Author(s) -

Legrand P. B.,

Dauchot J. P.,

Wautelet M.,

Hecq M.

Publication year - 1994

Publication title -

surface and interface analysis

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.52

H-Index - 90

eISSN - 1096-9918

pISSN - 0142-2421

DOI - 10.1002/sia.740220138

Subject(s) - sputtering , mass spectrometry , substrate (aquarium) , analytical chemistry (journal) , thin film , stoichiometry , in situ , materials science , nitride , oxide , chemistry , nanotechnology , layer (electronics) , chromatography , metallurgy , oceanography , organic chemistry , geology

Spectrometry of the soft x‐ray emitted by the growing film or its substrate during sputtering is used to monitor the film synthesis: determination of native oxide on the substrates, film stoichiometry versus experimental conditions, control of oxygen content during nitride synthesis, etc. Quantitative data can be obtained by using a simple exponential profile for the ionization function.

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