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Simultaneous appearance of sharp and diffuse spots in LEED: Experiments and simulation for Si
Author(s) -
Sakakibara Nobuyoshi,
Hisada Yoshiyuki,
Hattori Tadashi,
Goto Keisuke
Publication year - 1994
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740220125
Subject(s) - hexagonal crystal system , hydride , spots , crystallography , diffraction , surface (topology) , infrared , chemistry , molecular physics , materials science , hydrogen , optics , physics , geometry , mathematics , organic chemistry
The LEED technique has been used to analyze HF‐treated actual Si(111) surface. The observed LEED pattern showed a three‐fold symmetrical sharp and hexagonal symmetrical diffuse pattern that is considered to reflect disordered structures in the top surface of the Si. The pattern was compared with a three‐dimensional optical diffraction simulation. In the optical simulation, it was assumed that terminating hydrogen atoms at the Si(111) surface are so arranged that mono‐hydride and tri‐hydride structures are distributed at random. Then hexagonal symmetrical sharp spots and diffuse spots appeared simultaneously. The existence of Si—H, Si—H 2 , and Si—H 3 bonds was confirmed by infrared (IR) spectroscopy.