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Auger electron spectroscopy studies of interdiffusion in electrodeposited amorphous NiP alloys
Author(s) -
Bukaluk Antoni
Publication year - 1994
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740220107
Subject(s) - auger electron spectroscopy , annealing (glass) , amorphous solid , auger , analytical chemistry (journal) , amorphous metal , diffusion , materials science , electron , chemistry , crystallography , atomic physics , metallurgy , thermodynamics , physics , chromatography , quantum mechanics , nuclear physics
The effect of annealing on the Auger electron depth profiles of electrodeposited amorphous Ni 100‐ y P y /Ni 100‐ x P x (15 < x < 32 at.%, y > x ) thin film couples is studied at temperatures in the range 190–280 °C. Diffusion coefficients are evaluated by means of the Boltzmann–Matano method. The composition dependence of diffusion coefficients is explained by the role of free volumes in amorphous materials on interdiffusion.