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SIMS imaging of insulator surfaces
Author(s) -
van der Heide P. A. W.,
McIntyre N. S.
Publication year - 1993
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740201211
Subject(s) - secondary electrons , ion , insulator (electricity) , secondary emission , secondary ion mass spectrometry , ion beam , coating , electrical conductor , analytical chemistry (journal) , materials science , electron , chemistry , atomic physics , optoelectronics , nanotechnology , physics , nuclear physics , organic chemistry , chromatography , composite material
Imaging of secondary ions emitted from bare insulator surfaces has been carried out on a Cameca IMS 3F secondary ion mass spectrometer without the use of electron beam, conductive grid or coating methods. This was accomplished by analysing secondary ions with kinetic energies ranging from 200 to 350 eV emitted from chargestablized samples. Charge stabilization was attained by placing the sample under various forms of specimen isolation. Images from both O − and Cs + primary ion‐bombarded surfaces were collected, with several examples shown; O − provided the better spatial resolution due to improved sample potential stability. Mechanisms associated with charge stabilization and image distortion are elaborated upon with the aid of computer simulations.