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Fundamental parameters in quantitative depth profiling and bulk analysis with glow discharge spectrometry
Author(s) -
Payling Richard,
Jones D. G.
Publication year - 1993
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740200907
Subject(s) - glow discharge , mass spectrometry , analytical chemistry (journal) , chemistry , materials science , plasma , environmental chemistry , chromatography , physics , nuclear physics
By re‐examining the roles played by the fundamental parameters in glow discharge spectrometry (GDS), a simpler approach to quantitative GDS is obtained. A new method is presented for separating the effects of the lamp parameters on emission yield, by varying the matrix. It is shown in the normal working ranges that emission yield depends on lamp pressure only and not on lamp voltage and current as previously thought. The theory is applied to depth profiles from three very different commercial metallic‐coated steels and good agreement is obtained with SEM–energy‐dispersive spectroscopy (EDS) line scans of the coatings. The implications of using constant pressure for bulk analysis are also described. The ability of GDS to measure sputtering rates simultaneously with concentration is explored and good agreement is obtained for zinc–iron alloys with calculated sputtering rates based on surface concentrations.