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Surface modification of polymethylmethacrylate by UV light as studied by TOF‐SIMS
Author(s) -
van der Wel H.,
Lub J.
Publication year - 1993
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740200508
Subject(s) - photodegradation , secondary ion mass spectrometry , fragmentation (computing) , ion , static secondary ion mass spectrometry , mass spectrometry , chemistry , analytical chemistry (journal) , surface modification , photochemistry , materials science , chromatography , organic chemistry , photocatalysis , computer science , operating system , catalysis
In the present paper the chemical modification upon exposure with UV light of 185 nm and 254 nm in an Ar atmosphere of the surface of polymethylmethacrylate (PMMA) is studied with time‐of‐flight secondary ion mass spectrometry (TOF‐SIMS). The results show that UV photodegradation of PMMA does not induce large changes in the TOF‐SIMS spectra. However, changes in the relative peak intensities for the photolysed samples and comparison with results from PMMA fragmentation upon ion bombardment show that the photodegradation has proceeded to a considerable extent. In addition, small peaks are observed due to ions that originate from oxidized PMMA groups.