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The evolution of atomic scale topography by sputtering erosion
Author(s) -
Carter G.,
Nobes M. J.,
Stoere H.,
Katardjiev I. V.
Publication year - 1993
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740200113
Subject(s) - sputtering , atomic units , surface roughness , surface finish , erosion , surface (topology) , materials science , scale (ratio) , geometry , chemistry , chemical physics , statistical physics , physics , mathematics , nanotechnology , metallurgy , geology , composite material , geomorphology , thin film , quantum mechanics
A numerical simulation of mediated random removal of atoms froma square array is presented. The removal probability is weighted according to the local surface orientation in order to model the effect of orientationdependent sputtering yield and it is demonstrated that this results in greatly reduced surface roughness development. This implies improved depth resolution in sputter lepth profiling over that predicted from equal probability random atomic removal processes.