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Correlation of hydrogen content with properties of oxidic thin films
Author(s) -
Ottermann C. R.,
Bange K.,
Wagner W.,
Laube M.,
Rauch F.
Publication year - 1992
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740190181
Subject(s) - thin film , hydrogen , materials science , sputtering , evaporation , refractive index , chemical engineering , analytical chemistry (journal) , chemistry , nanotechnology , optoelectronics , organic chemistry , chromatography , engineering , thermodynamics , physics
Hydrogen and hydrogen‐containing species (H 2 O, OH etc.) play a dominant role in the various properties of glass surfaces and technical oxidic thin films deposited on glass. The amount of hydrogen and its distribution with depth are influenced by preparation and production processes, film materials, density and voids, etc. The 15 N nuclear reaction technique, which works quantitatively and non‐destructively, was used to investigate glass surfaces and thin films of TiO 2 , Ta 2 O 5 and SiO 2 produced by sol‐gel processes, reactive evaporation, sputtering and ion plating on glass substrates. An increase or decrease in hydrogen content influences optical and mechanical properties such as the refractive index and adhesion of the films.