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Monte‐Carlo simulations of the point‐to‐point resolution in scanning Auger microscopy and x‐ray microanalysis of thin overlayers
Author(s) -
Valamontes E.,
Nassiopoulos A. G.,
Glezos N.
Publication year - 1992
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740190178
Subject(s) - monte carlo method , microanalysis , auger electron spectroscopy , resolution (logic) , thin film , computational physics , analytical chemistry (journal) , optics , physics , materials science , chemistry , mathematics , statistics , nanotechnology , nuclear physics , organic chemistry , chromatography , artificial intelligence , computer science
The point‐to‐point resolution of Auger electron spectroscopy is compared to that of x‐ray microanalysis of thin unsupported films and of thin films on a bulk material. Monte‐Carlo calculations are used in this respect. The incident beam is a Gaussian‐distributed curve with standard deviation σ o = 40 Å and an energy range 10–100 keV. A Point‐Spread‐Function describing the radial distribution of the analysed signal is, in each case, determined from the Monte‐Carlo results. From this function and by using the Rayleigh criterion, the point‐to‐point resolution is calculated.