Development of a hyperthermal oxygen‐atom generator
Author(s) -
Hoflund Gar B.,
Davidson Mark R.,
Outlaw R. A.
Publication year - 1992
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740190161
Subject(s) - flux (metallurgy) , oxygen , atomic physics , desorption , atom (system on chip) , chemistry , oxygen atom , electron , analytical chemistry (journal) , generator (circuit theory) , physics , adsorption , molecule , nuclear physics , thermodynamics , power (physics) , organic chemistry , chromatography , computer science , embedded system
Abstract A source that is compact, durable and mounts on a standard standard ultrahigh vacuum (UHV) flange has been developed for the generation of hyperthermal oxygen atoms. In this source oxygen atoms permeate through an Ag membrane held at 500°C and are then emitted toward the target from the vacuum side of the membrane by electron‐stimulated desorption. The current prototype model generates useable O‐atom fluxes of ∼10 12 atoms cm −2 s −1 , and future modifications should increase this flux by 1–3 orders of magnitude. Based on the O + energy distribution, the average O neutral energy is ∼5 eV with a fairly broad distribution (full width at half‐maximum ∼3.6 eV). The information required for the development of this source and the design of the source are prsented.