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Improved depth resolution of AES in‐depth profiling
Author(s) -
Barna A.,
Sulyok A.,
Menyhard M.
Publication year - 1992
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740190117
Subject(s) - auger , profiling (computer programming) , resolution (logic) , materials science , sputtering , analytical chemistry (journal) , optics , chemistry , atomic physics , nanotechnology , physics , thin film , artificial intelligence , computer science , chromatography , operating system
In the case of conventional Auger in‐depth profiling, the depth resolution increases with the thickness of the removed layer. It was demonstrated that by rotating the specimen, the depth resolution improves drastically in certain cases. Independently from this, A. Barna developed a phenomenological model to describe the change of surface topography developing due to ion sputtering. Based on his results, an Auger in‐depth profiling device has been built. The capability of the device was checked by measuring in‐depth profiles of NiCr multilayer structure. The depth resolution determined from the measured profile is roughly constant along the depth.