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Improved images with the scanning photoelectron microscope at the national synchrotron light source
Author(s) -
Ade Harald,
Ko ChengHao,
Johnson Erik D.,
Anderson Erik
Publication year - 1992
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740190107
Subject(s) - synchrotron , x ray photoelectron spectroscopy , microscope , photoelectric effect , microelectronics , beamline , optics , resolution (logic) , materials science , beam (structure) , nanotechnology , physics , computer science , nuclear magnetic resonance , artificial intelligence
We present recent developments with the scanning photoelectron microscope at beam line X1A (X1‐SPEM) at the National Synchrotron Light Source. It was the first to demonstrate elemental and chemical imaging with primary photoelectrons and achieve submicron resolution [ Appl. Phys. Lett. 56, 1841–1843 (1990)]. Subsequent improvements allow us now to acquire XPS images with lateral resolution approaching 0.1 μm. We have utilized the instrument to examine artificial structures such as microelectronic devices and describe here our preliminary work in the study of photon‐beam‐mediated chemistry on aluminum surfaces.