An Electron Spectroscopic Investigation of Attenuation Lengths of Electrons in SiO 2  in the Energy Range 450 eV ≤  E  kin  ≤ 3100 eV | Zendy

Ebel H. | Zendy; Ebel M. F. | Zendy; Svagera R. | Zendy; Hofmann A. | Zendy

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An Electron Spectroscopic Investigation of Attenuation Lengths of Electrons in SiO 2 in the Energy Range 450 eV ≤ E kin ≤ 3100 eV

Author(s) -

Ebel H.,

Ebel M. F.,

Svagera R.,

Hofmann A.

Publication year - 1992

Publication title -

surface and interface analysis

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.52

H-Index - 90

eISSN - 1096-9918

pISSN - 0142-2421

DOI - 10.1002/sia.740181207

Subject(s) - electron , atomic physics , attenuation length , range (aeronautics) , excited state , attenuation , x ray photoelectron spectroscopy , inelastic mean free path , auger electron spectroscopy , spectral line , mean free path , chemistry , physics , materials science , nuclear magnetic resonance , nuclear physics , optics , astronomy , composite material

An experimental determination of the attenuation lengths of electrons in SiO 2 by means of XPS and x‐ray‐excited Auger electron spectra gave a remarkable agreement with recently published inelastic mean free path data.

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