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Oxidation mechanisms on α‐brasses (10 and 30 at.% Zn) by optical methods and SIMS
Author(s) -
Beucher E.,
Lenglet M.,
Weber S.,
Scherrer S.
Publication year - 1992
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740180907
Subject(s) - zinc , oxide , fourier transform infrared spectroscopy , infrared , copper , brass , ultraviolet , polishing , chemistry , metal , spectroscopy , analytical chemistry (journal) , infrared spectroscopy , inorganic chemistry , materials science , metallurgy , chemical engineering , optics , optoelectronics , physics , organic chemistry , chromatography , quantum mechanics , engineering
Optical methods—Fourier transform infrared spectroscopy, ultraviolet‐visible‐near‐infrared spectroscopy (UV‐Vis‐NIR)—are used to control the oxidation products grown on the surface of cold‐worked α‐brasse (10 and 30 at.% zinc). The influence of sample preparation (mechanical polishing and chemical cleanings) on oxidation rates is also studied. The duplex oxide scale (copper oxides on the top of the layer and zinc oxide at the metal/oxide interface) obtained during brass oxidation and perfectly exhibited by SIMS depth profiles can be explained in terms of internal oxidation and of the semiconductor properties of ZnO and Cu 2 O.