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The surface photo‐oxidation of polystyrene. Part II: The application of ToF‐SIMS to monitor changes in the surface chemistry of neat polystyrene films
Author(s) -
O'Toole L.,
Short R. D.,
Bottino F. A.,
Di Pasquale G.,
Pollicino A.
Publication year - 1992
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740180906
Subject(s) - polystyrene , benzotriazole , chemistry , styrene , copolymer , secondary ion mass spectrometry , polymer , polymer chemistry , oxygen , irradiation , chemical engineering , mass spectrometry , degradation (telecommunications) , analytical chemistry (journal) , photochemistry , ion , organic chemistry , chromatography , telecommunications , physics , computer science , nuclear physics , engineering
Time‐of‐flight secondary ion mass spectrometry (ToF‐SIMS) has been employed to monitor the chemical changes occurring with continuous UV irradiation in the surface region of neat films of polystyrene and the copolymer of styrene and 2‐(2‐hydroxy‐3‐vinyl‐5‐methylphenyl)benzotriazole (HVB, 2% w/w). Previous conclusions concerning the relative rates of oxygen uptake of these systems have been confirmed. New data are presented that enable delineation of two different surface reactions and demonstrate activation of the polymer surface by HVB with respect to polymer degradation as well as oxygen uptake. Some conclusions are drawn concerning the mechanism by which this activation is achieved.