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Characterization of MoSi 2 coatings obtained by atmospheric pressure and low‐pressure plasma spraying
Author(s) -
Zacchetti N.,
Mizuno K.
Publication year - 1992
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740180804
Subject(s) - electron microprobe , microanalysis , x ray photoelectron spectroscopy , atmospheric pressure plasma , atmospheric pressure , materials science , coating , glow discharge , microstructure , deposition (geology) , characterization (materials science) , gas dynamic cold spray , analytical chemistry (journal) , substrate (aquarium) , plasma , metallurgy , chemical engineering , chemistry , composite material , nanotechnology , environmental chemistry , paleontology , physics , oceanography , organic chemistry , quantum mechanics , sediment , engineering , biology , geology
Abstract The high‐temperature oxidation resistance property of MoSi 2 coatings is strongly influenced by the chemical composition, density and structure of the deposit. The aim of this work is to determine the role of the deposition process in the microchemistry and microstructure of the coating. In order to achieve this task, we compare MoSi 2 produced by LPPS (low‐pressure plasma spraying) and conventional APPS (atmospheric pressure plasma spraying) techniques with the aid of a complementary use of characterization methods such as SEM, EPMA (electron probe microanalysis), CMA (computer‐aided microanalysis), GDOS (glow discharge optical spectroscopy) and XPS. From the overall results it is evident that the application of plasma spraying under low pressure considerably improves MoSi 2 layers. They are characterized by a higher density, with fewer pores and discontinuities, and have a more uniform chemical composition and a better coating‐substrate interface.