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XPS analysis of thin oxide films on chemically treated aluminum alloy surfaces using a high‐energy Mg/Zr anode
Author(s) -
Allgeyer Daniel F.,
Pratz Earl H.
Publication year - 1992
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740180702
Subject(s) - x ray photoelectron spectroscopy , auger , aluminium , alloy , materials science , bremsstrahlung , oxide , anode , auger electron spectroscopy , analytical chemistry (journal) , chemistry , metallurgy , atomic physics , chemical engineering , electron , electrode , physics , engineering , quantum mechanics , chromatography , nuclear physics
A method for determining the aluminum oxide and aluminum metal atomic concentrations on complex aluminum alloy surfaces using a high‐energy Mg/Zr x‐ray source (1253.6 and 2042.4 eV, respectively) was discussed. XPS analysis of chemically processed aluminum surfaces using an Mg or Mg/Al anode limits the analysis of aluminum to the Al 2s and Al 2p photoelectron lines. Analysis of aluminum surfaces using the Al KLL Auger transition and the Mg or Mg/Al x‐ray source is accomplished with the bremsstrahlung radiation. The utility of the high‐energy Mg/Zr x‐ray anode is realized by offering the ability to qualitatively and quantitatively analyze aluminum using the Al KLL Auger region at 1374–1405 eV kinetic energy. The Al KLL Zr excited Auger transition provides a clear separation between the aluminum oxide and metal transitions (6.0 eV).