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Study of interface diffusion of Ti and TiN PVD layers by Bremsstrahlung‐induced AES
Author(s) -
Meisel W.,
Hanzel D.
Publication year - 1992
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740180407
Subject(s) - tin , x ray photoelectron spectroscopy , physical vapor deposition , materials science , substrate (aquarium) , bremsstrahlung , diffusion , layer (electronics) , deposition (geology) , coating , nitrogen , metallurgy , titanium nitride , analytical chemistry (journal) , chemical engineering , chemistry , nitride , composite material , photon , oceanography , engineering , biology , paleontology , quantum mechanics , chromatography , thermodynamics , physics , organic chemistry , sediment , geology
The influence of heat treatment in ultrahigh vacuum (UHV) on Ti and TiN layers coated by physical vapour deposition (PVD) has been studied by AES, XPS and bremsstrahlung‐induced AES. It could be concluded that up to 500° C (1 h) the Ti layer does not change significantly. At the TiN/steel substrate interface, however, a counterdiffusion of nitrogen and adventitious oxygen takes place, resulting in partial nitridation of the steel substrate and oxidation of the coating.