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Quantification of surface hydroxides using chemical labeling and XPS
Author(s) -
Dang Tuan A.,
Gnanasekaran R.,
Deppe Denise D.
Publication year - 1992
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740180214
Subject(s) - x ray photoelectron spectroscopy , silylation , hydroxide , silicate , chemistry , materials science , analytical chemistry (journal) , inorganic chemistry , mineralogy , chemical engineering , catalysis , chromatography , organic chemistry , engineering
XPS when used in conjunction with silylation can determine surface hydroxide. The penetration depth was studied using DRIFT and various silylation conditions. Application of this technique to many different inorganic matrices, including Si 3 N 4 , glass, silica thin film, zinc silicate lamp phosphor and Al 2 O 3 , is illustrated.