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Quantitative trace analysis by non‐resonant laser post‐ionization
Author(s) -
Hayashi S.,
Hashiguchi Y.,
Suzuki K.,
Ohtsubo T.,
McIntosh B. J.
Publication year - 1991
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740171105
Subject(s) - ionization , laser , excimer laser , mass spectrometry , chemistry , atomic physics , ion , atmospheric pressure laser ionization , analytical chemistry (journal) , electron ionization , impurity , materials science , optics , physics , organic chemistry , chromatography
In order to overcome the poor quantitativeness of conventional SIMS, sputtered neutral mass spectrometry (SNMS) employing non‐resonant laser post‐resonant laser post‐ionization has been studied. By studied. By combining a time‐of‐flight (TOF) analyzer with a powerful excimer laser, it was confirmed that non‐resonant laser post‐ionization is capable of quantitative analysis of impurities at the pm level. On comparing laser wavelengths, 193 nm (ArF) gave a higher post‐ionization efficiency than 248 nm (KrF). It was also demonstrated that the electronegative element sulphur can be detected as positive ions by post‐ionization. Furthermore, surface metallic contaminants in a small area (250 μm square) could be determined down to 10 11 atoms cm −2 .