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AES/GDS characterization of thin oxide films on FeCr sheet steels
Author(s) -
Suzuki S.,
Suzuki K.
Publication year - 1991
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740170803
Subject(s) - auger electron spectroscopy , manganese , materials science , silicon , chromium , analytical chemistry (journal) , thin film , oxide , glow discharge , silicon oxide , sputtering , metallurgy , spectroscopy , chemistry , nanotechnology , physics , plasma , silicon nitride , chromatography , quantum mechanics , nuclear physics
Thin oxide films on four kinds of commercial sheet were characterized with Auger electron spectroscopy (AES) and glow discharge optical emission spectroscopy (GDS). Enrichment of alloying elements was noticed in the thin oxide films formed in air. The depth profiles obtained by AES with ion sputtering showed that enrichment of chromium occurred at the interface between the oxide and the matrix. It was difficult with AES to obtain the profiles of silicon and manganese because of overlap of their peaks with the iron peaks on the spectrum. On the other hand, with GDS, silicon and manganese could be analysed quantitatively in thin films that are <0.05 μm thick.