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Quantitative analysis of W(N), TiW and TiW(N) matrices using XPS, AES, RBS, EPMA and XRD
Author(s) -
Alay J. L.,
Bender H.,
Brijs G.,
Demesmaeker A.,
Vandervorst W.
Publication year - 1991
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740170613
Subject(s) - x ray photoelectron spectroscopy , electron microprobe , tungsten , sputtering , analytical chemistry (journal) , titanium , nitride , materials science , chemistry , metallurgy , nuclear chemistry , layer (electronics) , thin film , chemical engineering , nanotechnology , environmental chemistry , engineering
The structural and quantitative chemical analyis of tungsten nitrides and titanium–tungsten nitrides with variable N content (denoted as W(N) and TiW(N)) are explored by a combination of different analysis techniques. Special attention is given to the unraveling by XPS of the different binding states that are present in the surface contamination layer and in the bulk of the layers. The determination of our own sensitivity factors is essential for accurate quantification of both XPS and AES data. Comparison of the different techniques shows the presence of strong preferential sputtering for W(N) alloys, whereas this effect is unimportant for TiW(N). The influence of the vacuum of the analysis chamber of XPS and AES on the results is studied thoroughly.