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Periodic variations in the nitrogen KLL Auger intensity from interstitial nitride films
Author(s) -
Dawson Peter T.
Publication year - 1991
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740170608
Subject(s) - auger electron spectroscopy , auger , nitride , torr , analytical chemistry (journal) , nitrogen , chemistry , transition metal , scanning electron microscope , materials science , atomic physics , nanotechnology , layer (electronics) , composite material , biochemistry , physics , organic chemistry , chromatography , nuclear physics , catalysis , thermodynamics
Transition metal nitride films have been prepared by reaction of ammonia gas at 300 Torr pressure with nine different transition metals at high temperatures in the range 900–1200°C. The films produced were typically microns thick and could therefore be characterized by x‐ray diffraction, in addition to Auger electron spectroscopy and scanning electron microscopy. Strong periodic variations in the intensity of the nitrogen KLL Auger emission have been observed from the nitrides of Ti, V, Cr, Zr, Nb, Mo, Hf, Ta and W. The measured nitrogen signal was observed to decrease within each group, and also across each period. These results are discussed with reference to matrix effects in the Auger emission and the stability and structure of the interstitial nitrides.