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Role of oxygen contamination on titanium nitriding
Author(s) -
Saillard P.,
Gicquel A.,
Amouroux J.,
Moncoffre N.,
Tousset J.
Publication year - 1990
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.7401601110
Subject(s) - nitriding , contamination , oxygen , titanium , materials science , plasma , nitride , substrate (aquarium) , oxide , titanium oxide , titanium nitride , metallurgy , phase (matter) , gas phase , analytical chemistry (journal) , chemical engineering , chemistry , layer (electronics) , environmental chemistry , composite material , ecology , physics , oceanography , organic chemistry , quantum mechanics , biology , geology , engineering
Abstract Titanium nitridation has been achieved in a tubular reactor under a radio frequency low‐pressure plasma. The influence of the plasma working parameters (substrate temperature, nature of the gas phase and plasma input power) on the superficial nitride/oxide ratio has been investigated. The influence of the oxygen bulk contamination on nitridation kinetics is also reported.