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Characterization of nitrogen distribution profiles in fcc transition metal nitrides by means of T c measurements
Author(s) -
Lengauer Walter
Publication year - 1990
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740150606
Subject(s) - tin , characterization (materials science) , nitride , nitrogen , materials science , isotropy , titanium nitride , analytical chemistry (journal) , tantalum nitride , metal , etching (microfabrication) , transition metal , metallurgy , chemistry , composite material , nanotechnology , layer (electronics) , optics , biochemistry , physics , organic chemistry , chromatography , catalysis
The suitability of characterizing the nitrogen distributions in near‐surface regions of compact samples of TiN, ZrN, HfN, VN and NbN by means of a series of inductive T c measurements with successive etching was investigated. The distribution profiles could be determined for TiN, ZrN and VN with an accuracy exceeding that of established microanalytical tools. One problem encountered in the characterization process was the non‐isotropic removal of layers. For HfN and NbN, nitrogen profile measurements were not possible because of the intrinsic T c behaviour.