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A new lineshape for fitting x‐ray photoelectron peaks
Author(s) -
Losev A.
Publication year - 1989
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740141207
Subject(s) - x ray photoelectron spectroscopy , x ray , simple (philosophy) , computational physics , analytical chemistry (journal) , materials science , chemistry , nuclear magnetic resonance , physics , optics , environmental chemistry , philosophy , epistemology
A new asymmetric lineshape with four parameters is proposed for fitting x‐ray photoelectron peaks. Some of its properties are elucidated, as it is compared with previously used lines. A simple way of implementing a computer routine is suggested and examples of applications are presented.