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On the role of water in the photoinduced oxidation of amorphous Ge—Se films
Author(s) -
Schroeter B.,
Abraham M.,
Broese E.,
Weissbrodt P.,
Melcher N.
Publication year - 1989
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740141205
Subject(s) - oxidizing agent , amorphous solid , x ray photoelectron spectroscopy , atmosphere (unit) , oxide , oxidation process , composition (language) , materials science , chemistry , chemical engineering , metallurgy , crystallography , organic chemistry , geography , linguistics , philosophy , engineering , meteorology
The photoinduced oxidation of sputtered amorphous Ge—Se films is investigated by AES, XPS and XAES. By variation of the composition of the oxidizing atmosphere, the dominant role of water in the oxidation process is established. The tendency for oxide formation is found to be strongly correlated with the composition of the oxidizing atmosphere and of the Ge—Se film.