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Quantitative predictions of sputtering phenomena
Author(s) -
Eckstein W.
Publication year - 1989
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740141202
Subject(s) - sputtering , computer science , experimental data , statistical physics , materials science , physics , nanotechnology , mathematics , thin film , statistics
Computer simulation is used extensively in studying sputtering. The different approaches are briefly discussed to show the main advantages of the methods applied. The basic assumptions in the calculations will be considered critically. The main topic will be the discussion of the comparison between calculated and experimental data to demonstrate the agreement achieved.