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Quantitative AES and XPS investigation of magnetron sputtered TiN x films
Author(s) -
Bender H.,
Portillo J.,
Vandervorst W.
Publication year - 1989
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740140610
Subject(s) - x ray photoelectron spectroscopy , auger electron spectroscopy , tin , analytical chemistry (journal) , sputter deposition , cavity magnetron , materials science , background subtraction , auger , electron spectroscopy , sputtering , thin film , chemistry , metallurgy , atomic physics , nuclear magnetic resonance , physics , nanotechnology , optics , pixel , chromatography , nuclear physics
The possibilities for quantitative compositional analysis of TiN x layers prepared by d.c. magnetron sputtering with Auger electron spectroscopy and x‐ray photoelectron spectroscopy are discussed. As an alternative to the AES quantification schemes reported in the literature, methods based on the ‘peak‐to‐peak‐minus‐ x ‐eV‐height’ and ‘factor analysis’ are examined. Different background subtraction methods are studied for the XPS quantification.