Premium
Ion sputter rates of CrMnFe spinel oxides
Author(s) -
Wild R. K.
Publication year - 1989
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740140505
Subject(s) - spinel , sputtering , oxide , microprobe , materials science , argon , ion , analytical chemistry (journal) , tantalum , metallurgy , tantalum pentoxide , mineralogy , chemistry , thin film , nanotechnology , organic chemistry , chromatography
The oxide which forms on stainless steel is duplex in nature, with an outer spinel covering an inner rhombohedral Cr 2 O 3 . The thickness of the oxide is only a few micrometers, even after many thousands of hours of oxidation at high temperatures, and hence surface analytical techniques are required to characterize the oxide. In particular, depth analysis is obtained using the scanning Auger microprobe in conjunction with argon ion bombardment. The etch rates are at present assumed to be the same as that measured using a tantalum oxide standard. To obtain a more accurate measure of sputter rates on the spinel oxides 20%Cr/25%Ni/TiN‐strengthened steel has been oxidized and the thickness determined by independent means. These data have then been used to determine the etch rates, which are compared with that on tantalum pentoxide.