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XPS study of the Al/Pd interface
Author(s) -
Légaré P.,
Finck F.,
Maire G.,
Roche R.
Publication year - 1989
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740140309
Subject(s) - x ray photoelectron spectroscopy , crystallite , valence (chemistry) , substrate (aquarium) , materials science , layer (electronics) , irradiation , chemistry , crystallography , analytical chemistry (journal) , metallurgy , chemical engineering , nanotechnology , geology , physics , oceanography , organic chemistry , nuclear physics , engineering , chromatography
The formation of the interface between a Pd polycrystalline substrate and Al deposits was followed by photoemission. Interdiffusion takes place readily and shows an evolution with time as well as under electron irradiation. The thickness of the mixed layer depends on the thickness of the Al deposit. The effect results in a narrowing of the Pd valence states.