Premium
Quantitation of coverages on rough surfaces by XPS: An overview
Author(s) -
Fulghum Julia E.,
Linton Richard W.
Publication year - 1988
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740130404
Subject(s) - x ray photoelectron spectroscopy , exponential function , surface (topology) , materials science , analytical chemistry (journal) , attenuation , sensitivity (control systems) , calibration , calibration curve , spectrometer , chemistry , optics , physics , mathematics , nuclear magnetic resonance , statistics , mathematical analysis , geometry , electronic engineering , chromatography , detection limit , engineering
Abstract Selected methods for the XPS quantitation of surface coverages are summarized with an emphasis on non‐planar samples with overlayers, e.g. powders of high surface area. Equations have been modified for uniform terminology and are presented based on a photoelectron spectrometer with an E −1 transmission function. Approaches which require a minimum of information from independent analytical techniques are given special consideration. Quantitative schemes discussed include calibration curves, surface sensitivity factors, exponential attenuation of bulk signals by overlayers, catalyst models, and the use of subshell twins or peak shape distortions related to photoelectron energy losses.