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Analysis of the tantalum segregation in films of non‐stoichiometric TaSi x
Author(s) -
Hösler W.,
Rudnick W.,
Gräbel H.,
Gräber K.,
Hillmer T.,
Mitwalsky A.
Publication year - 1988
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740120610
Subject(s) - siemens , ring (chemistry) , mathematics , engineering , chemistry , electrical engineering , organic chemistry