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Applications of in situ SIMS during processing of electronic materials
Author(s) -
Webb A. P.,
Smith J. A.
Publication year - 1988
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740120506
Subject(s) - in situ , instrumentation (computer programming) , materials science , etching (microfabrication) , layer (electronics) , nanotechnology , computer science , chemistry , operating system , organic chemistry
An in situ SIMS system is described that is capable of providing accurate and reliable control in determining the termination of processes whilst etching through multi‐layer structures. The instrumentation is described and how progressive alterations have been implemented to improve the sensitivity. Various applications are described which show the wide range of material systems that have already been addressed.