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Surface layers on fe formed during plasma nitriding studied by XPS and reflection EELS
Author(s) -
Strydom I. le R.,
Wells A.,
Ferreira N. P.
Publication year - 1988
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740120307
Subject(s) - nitriding , x ray photoelectron spectroscopy , nitride , iron nitride , ferrous , layer (electronics) , plasma , surface layer , analytical chemistry (journal) , materials science , chemistry , metallurgy , chemical engineering , composite material , physics , quantum mechanics , chromatography , engineering
Anomalous compound surface layer growth is observed during plasma nitriding of ferrous materials under certain operating conditions. The formation of an iron oxy‐nitride layer by the redeposition of sputtered cathode material was found to influence the growth kinetics of the γ'‐Fe 4 N layer which forms during plasma nitriding of α‐Fe to the extent where the γ'‐Fe 4 N surface layer initially increases and subsequently decreases in thickness after deposition of the iron oxy‐nitride layer. The nature of these layers was studied by XPS and reflection EELS to elucidate the electron structure of the valence bands of these compunds. Results are Results are presented which explain the thermodynamic stability of the iron oxy‐nitride layer and the apparent de‐nitriding effect that this layer formation has on the underlying γ'‐Fe 4 N layer.