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Automated interface recognition in auger sputter depth profiling
Author(s) -
Hill Malcolm D.
Publication year - 1988
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740120107
Subject(s) - auger , sputtering , auger electron spectroscopy , profiling (computer programming) , ion , auger effect , materials science , interface (matter) , irradiation , analytical chemistry (journal) , chemistry , atomic physics , thin film , nanotechnology , computer science , physics , nuclear physics , composite material , organic chemistry , capillary number , chromatography , capillary action , operating system
A range of materials systems has been studied in order to establish whether remote sensing of proximity to an abrupt hetero‐interface can be achieved, in real‐time, during Auger depth profiling. Changes in the absorbed electron current, during both electron and ion beam irradiation of the sample, and variations in the secondary ion yield during sputtering have been measured. In each materials system one or more of these signals has been found to indicate an approaching interface at a significant distance from the onset of the interface in the Auger profile. The application of these findings to the development of methods of acquiring Auger depth profiles rapidly, but without loss of depth resolution at interfaces, is discussed.