Application of reflectance studies to layered samples: SiO  x   on InSb | Zendy

Remond G. | Zendy; Holloway P. H. | Zendy; Caye R. | Zendy; Ruzakowski P. | Zendy

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Application of reflectance studies to layered samples: SiO x on InSb

Author(s) -

Remond G.,

Holloway P. H.,

Caye R.,

Ruzakowski P.

Publication year - 1988

Publication title -

surface and interface analysis

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.52

H-Index - 90

eISSN - 1096-9918

pISSN - 0142-2421

DOI - 10.1002/sia.740110303

Subject(s) - refractive index , molar absorptivity , reflectometry , reflectivity , materials science , substrate (aquarium) , optics , homogeneous , extinction (optical mineralogy) , analytical chemistry (journal) , chemistry , optoelectronics , physics , time domain , oceanography , chromatography , computer science , computer vision , thermodynamics , geology

Spatially resolved optical micro‐reflectometry in the visible region (from 400 nm to 800 nm) is used to study InSb substrates covered with SiO x (1 < x < 2) films of known thicknesses. Using optical constants (refractive index and extinction coefficient) for uncoated InSb derived from two successive reflectance measurements carried out in air and oil, a model of absorbing films on an absorbing substrate was used to calculate the reflectance. Comparison of measured and calculated reflectances for SiO 2 films over InSb demonstrate the validity of the model for an absorbing substrate covered with a homogeneous layer. Optical constants for the SiO x layers are obtained from comparisons between experimental and calculated reflectance curves.

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