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Quantitative depth profiling by glow discharge mass spectrometry
Author(s) -
Hall D. J.,
Sanderson N. E.
Publication year - 1988
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740110105
Subject(s) - mass spectrometry , analytical chemistry (journal) , nanometre , chemistry , matrix (chemical analysis) , resolution (logic) , detection limit , glow discharge , spectrometer , optics , physics , chromatography , plasma , nuclear physics , computer science , artificial intelligence
The ability of the VG 9000 glow discharge mass spectrometer to perform highly quantitative materials analysis has led to applications of the instrument in the field of depth profiling. The result has been the emergence of a technique that is capable of performing rapid quantitative depth analysis for a wide range of elements to sub ppm detection limits. Preliminary investigations into depth resolution suggest the capability of resolving nanometre scale structures. Quantitation is achieved by direct ratioing of ion beams to that of the matrix: elemental sensitivity factors, determined from standards, vary by less than an order of magnitude across the periodic table, and are relatively matrix independent, so that high accuracy results may be attained without the need for closely matching standards and matrix. A high resolution double‐focusing mass spectrometer affords clear separation of atomic peaks from the majority of the inevitable low level molecular species in the mass spectrum, which would otherwise limit the accuracy of trace element determinations.