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Multilayer thin film thickness determination with variable exit angle ultrasoft x‐ray fluorescence spectrometry
Author(s) -
Scimeca T.,
Andermann G.
Publication year - 1987
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740100702
Subject(s) - materials science , thin film , x ray fluorescence , analytical chemistry (journal) , fluorescence , optics , resolution (logic) , intensity (physics) , sample (material) , mass spectrometry , spectroscopy , chemistry , physics , nanotechnology , artificial intelligence , computer science , chromatography , quantum mechanics
A theoretical method for obtaining the thickness of thin multilayer films using variable exit angle ultrasoft x‐ray fluorescence spectroscopy is presented. The theoretical approach is based on calculating the ratio of a film's intensity to either an external or internal bulk standard or to another film's intensity within the same sample. The theoretical depth resolution is also discussed using both ratio methods for Fe, Ni multilayer systems. Using this non‐destructive method, some experimental results are also presented for these multilayers.