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Glow discharge sputtering of alloys observed by atomic absorption spectroscopy
Author(s) -
Teo W. B.,
Hirokawa K.
Publication year - 1987
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740100605
Subject(s) - glow discharge , sputtering , atomic absorption spectroscopy , copper , analytical chemistry (journal) , nickel , spectroscopy , materials science , chemistry , absorption (acoustics) , plasma , thin film , metallurgy , nanotechnology , composite material , physics , chromatography , quantum mechanics
Sputtering procedures are often employed in the field of material preparation such as thin films and surface analysis. In this report the atomic absorption spectroscopic technique is applied to observe sputtering phenomena of typical binary alloys of copper–nickel and coppersilver, as occurring in a hollow cathode glow discharge. A parameter μ α−β correlating the composition of the sample with the composition of the produced plasma which was measured with atomic absorption spectroscopy, is used to monitor changes in the surface composition. Measurements at a natural high surface temperature of the sample during glow discharge and at a lower temperature by cooling with liquid nitrogen were performed. AES analysis of the glow discharge sputtered surfaces of uncooled samples show that a very deep altered layer can be produced.