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An X‐ray photoelectron spectroscopic study of a nitric acid/argon ion cleaned uranium metal surface at elevated temperature
Author(s) -
Paul Alan J.,
Sherwood Peter M. A.
Publication year - 1987
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740100503
Subject(s) - x ray photoelectron spectroscopy , uranium , nitric acid , argon , metal , chemistry , carbide , atmospheric temperature range , analytical chemistry (journal) , oxide , ion , metal ions in aqueous solution , etching (microfabrication) , inorganic chemistry , nuclear chemistry , materials science , metallurgy , layer (electronics) , chemical engineering , environmental chemistry , physics , organic chemistry , meteorology , engineering
X‐ray photoelectron spectroscopy has been used to study the surface of uranium metal cleaned by nitric acid treatment and argon ion etching, followed by heating in a high vacuum. The surface is shown to contain UO 2− x species over the entire temperature range studied. Heating to temperatures in the range 400–600°C generates a mixture of this oxide, the metal and a carbide and/or oxycarbide species.