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SIMS depth profiling of Al/Nb multilayer structure using Ne, Ar, Kr and Xe ions and neutral species
Author(s) -
Taylor E.,
Blanchard B.,
Villegier J. C.
Publication year - 1987
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740100102
Subject(s) - ion , atomic physics , xenon , krypton , chemistry , mass spectrometry , analytical chemistry (journal) , physics , organic chemistry , chromatography
Depth profiles of Al/Nb multilayer sandwich samples composed of 20 alternating layers (each of 20 Å mean thickness) were obtained by secondary ion mass spectrometry using the Cameca IMS 300. Under bombardment with ions and neutral atoms of Ne, Ar, Kr, and Xe, having energies between 1.5KeV and 5.5 KeV, the effect of the mass and energy of the incident particle on the in‐depth resolution was investigated. The layers were easily visible with atoms of Kr and Xe at 2.0 KeV and 1.5 KeV primary energies while considerable inter‐layer modulations were registered in other cases. An interpretation of the artefacts observed at the beginning and the end of the profiles obtained with 5.5 KeV primary ions was given.